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Improved analog and AC performance for high frequency linearity based applications using gate-stack dual metal (DM) nanowire (NW) FET (4H-SiC)

Neeraj Neeraj, Shobha Sharma, Anubha Goel, Sonam Rewari, R.S. Gupta

2023Microsystem Technologies13 citationsDOI

Topics & Concepts

Materials scienceTransconductanceNanowireOptoelectronicsIntermodulationSubthreshold slopeLinearityField-effect transistorTransistorElectrical engineeringVoltageCMOSEngineeringAmplifierAdvancements in Semiconductor Devices and Circuit DesignSilicon Carbide Semiconductor TechnologiesSemiconductor materials and devices
Improved analog and AC performance for high frequency linearity based applications using gate-stack dual metal (DM) nanowire (NW) FET (4H-SiC) | Litcius