Graphitic Carbon Nitride-Based Photocatalytic Materials: Preparation Strategy and Application
Liyan Wang, Kehan Wang, Tingting He, Yang Zhao, Hua Song, Huan Wang
Abstract
Among various kinds of photocatalytic semiconductors, graphitic carbon nitride (g-C3N4)-based photocatalysts have become the most attractive “celebrity” because of their stable chemical properties, appropriate band structure, and facile synthesis. Here, we provide a systematic review of g-C3N4-based photocatalytic materials based on the latest related research progress. The design ideas and preparation methods of g-C3N4-based photocatalysts are summarized, including morphology control of a three-dimensional structure, active site engineering, defect/vacancy engineering, and interface engineering. In addition, the typical applications of g-C3N4-based photocatalysts are also discussed in detail, involving water splitting (overall water splitting, H2 evolution, O2 evolution), organic transformation reactions (oxidation reaction, reduction reaction, coupling reaction), and degradation of organic pollutants. This perspective ends with a summary and perspectives on facing the challenges and directions of future development in this research field.