Pollutant inhibition in an extreme ultraviolet lithography machine by dynamic gas lock
Shuai Teng, Ming Hao, Jiaxing Liu, Xin Bian, Yuanhua Xie, Kun Liu, Kun Liu
Topics & Concepts
Extreme ultraviolet lithographyWaferLithographyMaterials scienceVolumetric flow rateExtreme ultravioletUltravioletDeposition (geology)Direct simulation Monte CarloMechanicsOptoelectronicsMonte Carlo methodChemistryOpticsPhysicsLaserBiologyStatisticsPaleontologyMathematicsSedimentDynamic Monte Carlo methodGas Dynamics and Kinetic TheoryPlasma Diagnostics and ApplicationsAdvancements in Photolithography Techniques