Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography
Wenze Yao, Hongcheng Xu, Haojie Zhao, Tao Ming, Jie Liu
Topics & Concepts
Electron-beam lithographyLithographyEnhanced Data Rates for GSM EvolutionCathode rayOpticsX-ray lithographyElectronAlgorithmStencil lithographyMaterials scienceResistPhysicsComputer scienceNanotechnologyArtificial intelligenceLayer (electronics)Quantum mechanicsAdvancements in Photolithography TechniquesImage Processing Techniques and ApplicationsNanofabrication and Lithography Techniques