Plasma-enhanced atomic-layer-deposited indium oxide thin film using a DMION precursor within a wide process window
Su‐Hwan Choi, TaeHyun Hong, Seong‐Hwan Ryu, Jin‐Seong Park
Topics & Concepts
Materials scienceIndiumLayer (electronics)OxidePlasmaWindow (computing)Thin filmAtomic layer depositionProcess windowProcess (computing)NanotechnologyChemical engineeringOptoelectronicsAnalytical Chemistry (journal)MetallurgyComputer scienceEnvironmental chemistryPhysicsLithographyChemistryOperating systemQuantum mechanicsEngineeringThin-Film Transistor TechnologiesZnO doping and propertiesSemiconductor materials and devices