Litcius/Paper detail

A review on effect of various high-k dielectric materials on the performance of FinFET device

J Naveen Ananda Kumar, Shilpi Birla, Garima Agarwal

2022Materials Today Proceedings43 citationsDOI

Topics & Concepts

Materials scienceOptoelectronicsTransistorDrain-induced barrier loweringPolycrystalline siliconSiliconHigh-κ dielectricSubthreshold conductionCMOSField-effect transistorMOSFETGate oxideEngineering physicsGate dielectricShort-channel effectDielectricElectrical engineeringNanotechnologyThin-film transistorEngineeringVoltageLayer (electronics)Semiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance Devices