Deterministic Fabrication of Twisted Van Der Waals Structures
Yan Zhang, Yangjin Lee, Weifeng Zhang, Dekui Song, Kihyun Lee, Yan Zhao, Hao He, Zihan Zhao, Shi-Yu Wang, Kwanpyo Kim, Nan Liu
Abstract
Abstract In 2D van der Waals (vdW) materials, rotational misalignment by a twist angle between adjacent layers can significantly affect their properties, referred as twistronics. Accurate tuning of twist angle of vdW materials in a controllable and efficient way is highly required. Here a thin‐film assisted transfer (TAT) technique that can controllably fabricate vdW structures with deterministic twist angles (accuracy of 0.37°) is developed. The transparent and ultrathin film as transfer medium ensures the visible and intact manipulation of monolayer building blocks, thus constructing vdW architectures with multi‐materials and designated position. Multilayer homo‐/hetero‐architectures in the geometry of series connection, spiral structure and chiral symmetry at deterministic twist angles are for the first time demonstrated. They can be located on various substrates for both structural analysis and device application. The capability of fabricating twisted homo‐/hetero‐ vdW structures in a deterministic, high‐throughput manner will serve as a powerful tool for twistronics.