Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation
Guilherme Kretzmann Belmonte, Suelen Weimer Cendron, Pulikanti Guruprasad Reddy, Cleverson A. S. Moura, Mohamad G. Moinuddin, Peter Jerome, Satinder K. Sharma, Gabriela Albara Lando, Marcelo Puiatti, Kenneth E. Gonsalves, Daniel E. Weibel
Topics & Concepts
ResistExtreme ultraviolet lithographyPhotoresistIrradiationExtreme ultravioletMaterials scienceX-ray photoelectron spectroscopyLithographyPhotochemistryChemistryOptoelectronicsAnalytical Chemistry (journal)NanotechnologyChemical engineeringOpticsOrganic chemistryNuclear physicsEngineeringLayer (electronics)LaserPhysicsAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis