Hot target magnetron sputtering enhanced by RF-ICP source for CrNx coatings deposition
V.A. Grudinin, Dmitrii V. Sidelev, G.A. Bleykher, Y. N. Yuriev, В. П. Кривобоков, E. V. Berlin, V. Grigoriev, Aleksei Obrosov, Sabine Weiß
Topics & Concepts
Sputter depositionSputteringMaterials scienceAnalytical Chemistry (journal)Volumetric flow rateDeposition (geology)Cavity magnetronCoatingSubstrate (aquarium)Chromium nitrideNitrideInductively coupled plasmaInert gasThin filmPlasmaChemistryComposite materialLayer (electronics)NanotechnologyEnvironmental chemistryGeologyPaleontologyQuantum mechanicsOceanographyBiologySedimentPhysicsMetal and Thin Film MechanicsDiamond and Carbon-based Materials ResearchPlasma Diagnostics and Applications