Reactive force-field molecular dynamics simulation for the surface reaction of SiH (x = 2–4) species on Si(1 0 0)-(2 × 1):H surfaces in chemical vapor deposition processes
Naoya Uene, Takuya Mabuchi, Masaru Zaitsu, Shigeo Yasuhara, Takashi Tokumasu
Topics & Concepts
ChemisorptionDissociation (chemistry)DesorptionDangling bondMolecular dynamicsChemical vapor depositionPhysisorptionChemistryReaxFFThermal desorptionChemical reactionReaction dynamicsChemical physicsChemical bondThin filmPhysical chemistryAnalytical Chemistry (journal)MoleculeMaterials scienceSiliconComputational chemistryAdsorptionNanotechnologyInteratomic potentialOrganic chemistrySemiconductor materials and devicesThermal properties of materialsDiamond and Carbon-based Materials Research