Characterization of aluminum oxide thin films obtained by chemical solution deposition and annealing for metal–insulator–metal dielectric capacitor applications
G. Suárez-Campos, D. Cabrera‐German, Omar A. Castelo-González, Carlos Ávila-Avendaño, J.L. Fuentes-Ríos, Manuel Quevedo-López, R. Aceves, Hailin Hu, M. Sotelo-Lerma
Topics & Concepts
Materials scienceThin filmX-ray photoelectron spectroscopyAnnealing (glass)DielectricOxideAtomic layer depositionScanning electron microscopeTransmission electron microscopyAnalytical Chemistry (journal)OptoelectronicsChemical engineeringNanotechnologyComposite materialMetallurgyChemistryEngineeringChromatographySemiconductor materials and devicesCopper Interconnects and ReliabilityAnodic Oxide Films and Nanostructures