Origin of sputter damage during transparent conductive oxide deposition for semitransparent perovskite solar cells
Qing Yang, Weiyuan Duan, Alexander Eberst, Benjamin Klingebiel, Yueming Wang, Ashish Kulkarni, Andreas Lambertz, Karsten Bittkau, Yongqiang Zhang, S. А. Vitusevich, Uwe Rau, Thomas Kirchartz, Kaining Ding
Abstract
The origin of sputter damage during transparent conductive oxide deposition is ion bombardment rather than plasma radiation. Ion bombardment increased recombination, whereas plasma radiation reduced recombination.
Topics & Concepts
SputteringMaterials sciencePlasmaRecombinationPerovskite (structure)OxideElectrical conductorIrradiationDeposition (geology)RadiationTransparent conducting filmSputter depositionOptoelectronicsIonRadiation damageThin filmOpticsChemistryComposite materialNanotechnologyMetallurgyCrystallographyPhysicsBiologyPaleontologyGeneNuclear physicsOrganic chemistrySedimentBiochemistryQuantum mechanicsPerovskite Materials and ApplicationsChalcogenide Semiconductor Thin FilmsThin-Film Transistor Technologies