Recent advances in plasma etching for micro and nano fabrication of silicon-based materials: a review
Chaojiang Li, Yuxin Yang, Rui Qu, Xun Cao, Guodong Liu, Xin Jin, Yuxuan Liu, Sheng-Gui Liu, Wang Jiang, Xianchao Zhang
Abstract
This review provides the mechanism, simulation, chemistries and processes employed in the plasma etching of silicon-based materials. Current applications and research prospects in plasma etching for micro and nanofabrication are discussed.
Topics & Concepts
Materials sciencePlasma etchingNano-NanotechnologyEtching (microfabrication)SiliconPlasmaEngineering physicsOptoelectronicsComposite materialEngineeringNuclear physicsLayer (electronics)PhysicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignThin-Film Transistor Technologies