Bicyclic Topology Transforms Self-Assembled Nanostructures in Block Copolymer Thin Films
Brian J. Ree, Yusuke Satoh, Takuya Isono, Toshifumi Satoh
Abstract
Ongoing efforts in materials science have resulted in linear block copolymer systems that generate nanostructures via the phase separation of immiscible blocks; however, such systems are limited with regard to their domain miniaturization and lack of orientation control. We overcome these limitations through the bicyclic topological alteration of a block copolymer system. Grazing incidence X-ray scattering analysis of nanoscale polymer films revealed that bicyclic topologies achieve 51.3-72.8% reductions in domain spacing when compared against their linear analogue, which is more effective than the theoretical predictions for conventional cyclic topologies. Moreover, bicyclic topologies achieve unidirectional orientation and a morphological transformation between lamellar and cylindrical domains with high structural integrity. When the near-equivalent volume fraction between the blocks is considered, the formation of hexagonally packed cylindrical domains is particularly noteworthy. Bicyclic topological alteration is therefore a powerful strategy for developing advanced nanostructured materials for microelectronics, displays, and membranes.