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Damage-free finishing of Lu2O3 by combining plasma-assisted etching and low-pressure polishing

Peng Lyu, Min Lai, Ze Liu, Fengzhou Fang

2022CIRP Annals13 citationsDOI

Topics & Concepts

PolishingMaterials scienceMachinabilityEtching (microfabrication)FluenceMachiningSurface roughnessSurface finishLaserPlasmaElectropolishingOxideLutetiumComposite materialMetallurgyOpticsElectrolyteElectrodePhysicsChemistryLayer (electronics)Quantum mechanicsYttriumPhysical chemistryAdvanced Surface Polishing TechniquesElectronic and Structural Properties of OxidesDiamond and Carbon-based Materials Research
Damage-free finishing of Lu2O3 by combining plasma-assisted etching and low-pressure polishing | Litcius