Performance analysis for 263 nm AlGaN DUV EELD by different EBL techniques
Hameed Ur Rehman, Mussaab I. Niass, Fang Wang, Yuhuai Liu
Topics & Concepts
Materials scienceOptoelectronicsDiodeLaserUltravioletWavelengthCurrent (fluid)OpticsPhysicsThermodynamicsGaN-based semiconductor devices and materialsSemiconductor Quantum Structures and DevicesPhotocathodes and Microchannel Plates