Atomic-scale insights into the material removal mechanism of cerium oxide polished fused silica based on ReaxFF-MD
Fukun Li, Bai Yang, Haixiang Hu, Longxiang Li, Feng Zhang, Xiao Luo, Xuejun Zhang
Topics & Concepts
Materials scienceReaxFFCerium oxideAtomic unitsCeriumOxideNanometreChemical engineeringComplex oxideMechanism (biology)MetallurgyComposite materialMolecular dynamicsComputational chemistryChemistryPhilosophyEngineeringInteratomic potentialQuantum mechanicsPhysicsEpistemologyDiamond and Carbon-based Materials ResearchRadioactive element chemistry and processingIon-surface interactions and analysis