Plasma atomic layer etching of molybdenum with surface fluorination
Yong‐Jae Kim, Hojin Kang, Heeju Ha, Chang‐Koo Kim, Sungmin Cho, Heeyeop Chae
Topics & Concepts
Etching (microfabrication)FluorocarbonFluorinePlasmaMolybdenumReactive-ion etchingPlasma etchingAnalytical Chemistry (journal)Materials scienceIonSurface roughnessLayer (electronics)ChemistryInorganic chemistryNanotechnologyMetallurgyOrganic chemistryPhysicsQuantum mechanicsComposite materialPlasma Diagnostics and ApplicationsMetal and Thin Film MechanicsSemiconductor materials and devices