Optimizing of the Colloidal Dispersity of Silica Nanoparticle Slurries for Chemical Mechanical Polishing
Nengyuan Zeng, Hongdong Zhao, Yuling Liu, Chenwei Wang, Chong Luo, Wantang Wang, Tengda Ma
Topics & Concepts
SlurryZeta potentialMaterials scienceColloidal silicaChemical-mechanical planarizationDispersion (optics)Chemical engineeringPolishingDissolutionSodium dodecyl sulfateColloidDispersion stabilityDispersantParticle sizeParticle (ecology)DispersityNanoparticleComposite materialChromatographyNanotechnologyChemistryCoatingPolymer chemistryEngineeringGeologyOceanographyOpticsPhysicsAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationDiamond and Carbon-based Materials Research