Destructive Adsorption of Nitrogen Trifluoride (NF<sub>3</sub>) Using M-MOF-74 with Open Metal Sites
Shaomin Wang, Qian Zhang, Yitao Li, Si‐Chao Liu, Qing‐Yuan Yang
Abstract
High Resolution Image Download MS PowerPoint Slide Using solid adsorbents for the destructive sorption of nitrogen trifluoride (NF 3 ) presents a potential solution to its dual challenges as a potent greenhouse gas and hazardous compound in microelectronics. In this study, a series of MOFs (M-MOF-74, M = Mg, Co, Ni, Zn) with open metal sites (OMSs) are utilized for NF 3 adsorption. By employing single-component adsorption isotherms and the ideal adsorbed solution theory (IAST) selectivity calculations, the adsorption performance of various adsorbents is evaluated. The results indicate that Mg, Co, and Ni-MOF-74 exhibit high adsorption capacities for NF 3, while Zn-MOF-74 shows a lower adsorption capacity, likely due to the weaker Lewis acidity of Zn 2+ . Experimental findings from PXRD and gas adsorption studies indicate structural pore alteration in the MOF-74 series following NF 3 gas adsorption. Theoretical computational analyses reveal that the MOF-74 series has a higher adsorption affinity for NF 3 compared to N 2 . This research provides insights into the use of efficient MOF sorbents for the destructive adsorption of NF 3 .