Material removal and surface evolution of single crystal silicon during ion beam polishing
Hang Xiao, Yifan Dai, Ji’an Duan, Ye Tian, Jia Li
Topics & Concepts
PolishingMaterials scienceIon beamSurface roughnessWaferIon implantationSiliconIonSurface finishAmorphous solidOpticsBeam (structure)Composite materialOptoelectronicsChemistryCrystallographyPhysicsOrganic chemistryAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchIntegrated Circuits and Semiconductor Failure Analysis