Atomic Layer Deposition of Epitaxial Ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films
Jung Woo Cho, Myeong Seop Song, In Hyeok Choi, Kyoung‐June Go, Jaewoo Han, Tae Yoon Lee, Chihwan An, Hyung‐Jin Choi, Changhee Sohn, Min Hyuk Park, Seung‐Hyub Baek, Jong Seok Lee, Si‐Young Choi, Seung Chul Chae
Abstract
Abstract The groundbreaking discovery of unconventional ferroelectricity in HfO 2 opens exciting prospects for next‐generation memory devices. However, the practical implementation, particularly its epitaxial stabilization and a clearer understanding of its intrinsic ferroelectricity has been a significant challenge. The study arouses the potential importance of atomic layer deposition (ALD) for mass production in modern industries, demonstrating its proficiency in achieving epitaxial growth of ferroelectric Hf 0.5 Zr 0.5 O 2 (HZO) thin films on Yttria‐stabilized zirconia (YSZ) substrates. Moreover, with distinct ferroelectric switching currents, the work reveals the ferroelectric characteristics of epitaxial HZO thin films deposited through ALD on YSZ‐buffered Si substrates, which aligns well with CMOS technology. Overall, the results pave the way for a scalable synthesis system for ferroelectric HfO 2 ‐based materials, hinting at a bright future for low‐temperature epitaxial nanoelectronics.