Effects of oxygen sources on properties of atomic-layer-deposited ferroelectric hafnium zirconium oxide thin films
Ah-Jin Cho, Jihoon Jeon, Hong Keun Chung, In‐hwan Baek, Kun Yang, Min Hyuk Park, Seung‐Hyub Baek, Seong Keun Kim
Topics & Concepts
FerroelectricityMaterials scienceAtomic layer depositionOrthorhombic crystal systemThin filmMonoclinic crystal systemOptoelectronicsDielectricCoercivityHafniumZirconiumImpurityNanotechnologyCrystallographyCrystal structureMetallurgyChemistryPhysicsCondensed matter physicsOrganic chemistryFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesAdvanced Memory and Neural Computing