Study on the polishing mechanism of pH-dependent tribochemical removal in CMP of CaF2 crystal
Jie Guo, Jian Gong, Pengfei Shi, Chen Xiao, Liang Jiang, Lei Chen, Linmao Qian
Topics & Concepts
Chemical-mechanical planarizationMaterials sciencePolishingCrystal (programming language)Atomic force microscopyCorrosionMetallurgyLayer (electronics)Composite materialChemical engineeringNanotechnologyEngineeringProgramming languageComputer scienceAdvanced Surface Polishing TechniquesMetal and Thin Film MechanicsDiamond and Carbon-based Materials Research