Litcius/Paper detail

Achieving Superior Electrocatalytic Performance by Surface Copper Vacancy Defects during Electrochemical Etching Process

Niankun Guo, Hui Xue, Amurisana Bao, Zihong Wang, Jing Sun, Tianshan Song, Xin Ge, Wei Zhang, Keke Huang, Feng He, Qin Wang

2020Angewandte Chemie42 citationsDOI

Abstract

Abstract Vacancy defects of catalysts have been extensively studied and proven to be beneficial to various electrocatalytic reactions. Herein, an ultra‐stable three‐dimensional PtCu nanowire network (NNW) with ultrafine size, self‐supporting rigid structure, and Cu vacancy defects has been developed. The vacancy defect‐rich PtCu NNW exhibits an outstanding performance for the oxygen reduction reaction (ORR), with a mass activity 14.1 times higher than for the commercial Pt/C catalyst (20 %.wt, JM), which is currently the best performance. The mass activity of the PtCu NNW for methanol oxidation reaction (MOR) is 17.8 times higher than for the commercial Pt/C catalyst. Density‐functional theory (DFT) calculations indicate that the introduction of Cu vacancies enhances the adsorption capacity of Pt atoms to the HO* intermediate and simultaneously weakens the adsorption for the O* intermediate. This work presents a facile strategy to assemble efficient electrocatalysts with abundant vacancy defects, at the same time, provides an insight into the ORR mechanism in acidic solution.

Topics & Concepts

Vacancy defectCatalysisDensity functional theoryElectrochemistryMaterials scienceAdsorptionCopperEtching (microfabrication)NanowireMethanolChemical engineeringNanotechnologyCrystallographyChemistryPhysical chemistryComputational chemistryElectrodeMetallurgyOrganic chemistryLayer (electronics)EngineeringElectrocatalysts for Energy ConversionAdvanced battery technologies researchAdvanced Memory and Neural Computing
Achieving Superior Electrocatalytic Performance by Surface Copper Vacancy Defects during Electrochemical Etching Process | Litcius