Investigation of sidewall damage induced by reactive ion etching on AlGaInP MESA for micro-LED application
Younes Boussadi, N. Rochat, Jean‐Paul Barnes, Badhise Ben Bakir, Philippe Ferrandis, Bruno Masenelli, Christophe Licitra
Topics & Concepts
CathodoluminescenceOptoelectronicsPhotoluminescencePassivationReactive-ion etchingMaterials scienceEtching (microfabrication)LuminescenceIonSecondary ion mass spectrometryAnalytical Chemistry (journal)ChemistryNanotechnologyChromatographyLayer (electronics)Organic chemistryGaN-based semiconductor devices and materialsSemiconductor materials and devicesThin-Film Transistor Technologies