High carrier mobility tungsten-doped indium oxide films prepared by reactive plasma deposition in pure argon and post annealing
Gan Tian, Jingmei Li, Lili Wu, Jingquan Zhang, Xia Hao, Qingyuan Zhang, Ruixing Li, Wenhui Shi
Topics & Concepts
Materials scienceAnnealing (glass)Amorphous solidElectron mobilityTungstenDopingIndiumThin filmOxideArgonTransmittanceCrystallizationTransparent conducting filmCrystalliteChemical engineeringAnalytical Chemistry (journal)NanotechnologyOptoelectronicsMetallurgyCrystallographyChemistryOrganic chemistryEngineeringChromatographyZnO doping and propertiesGa2O3 and related materialsThin-Film Transistor Technologies