Atomic layer etching of SiO2 using trifluoroiodomethane
Seon Yong Kim, In‐Sung Park, Jinho Ahn
Topics & Concepts
Etching (microfabrication)PolymerIodineLayer (electronics)Substrate (aquarium)FluorocarbonAtomic layer depositionMaterials sciencePlasmaDeposition (geology)Silicon dioxideSiliconAnalytical Chemistry (journal)Plasma etchingChemical engineeringChemistryNanotechnologyOptoelectronicsChromatographyComposite materialGeologyMetallurgyPaleontologyOceanographyEngineeringSedimentPhysicsBiologyQuantum mechanicsPlasma Diagnostics and ApplicationsSemiconductor materials and devicesMetal and Thin Film Mechanics