Mechanism of friction-induced chemical reaction high-efficient polishing single crystal 4H-SiC wafer using pure iron
Min Wu, Hui Huang, Yueqin Wu, Zhiteng Xu, Tukun Li, Iain Macleod, Xiaolei Wu
Topics & Concepts
Materials scienceWaferPolishingCrystal (programming language)Chemical reactionMachiningReaction mechanismMetallurgyChemical-mechanical planarizationSolid-stateComposite materialReaction rateMetalSingle crystalNanotechnologyPhysical chemistryCrystallographyCatalysisChemistryProgramming languageBiochemistryComputer scienceAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis