Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes
Jae Hwan Lee, Bo‐Eun Park, David Thompson, Myeonggi Choe, Zonghoon Lee, Il‐Kwon Oh, Woo‐Hee Kim, Hyungjun Kim
Topics & Concepts
Atomic layer depositionElectrodeX-ray photoelectron spectroscopyMaterials scienceTinLayer (electronics)ZirconiumInsulator (electricity)MetalCapacitorAnalytical Chemistry (journal)OptoelectronicsNanotechnologyChemical engineeringChemistryMetallurgyVoltageElectrical engineeringChromatographyPhysical chemistryEngineeringSemiconductor materials and devicesElectrocatalysts for Energy ConversionFerroelectric and Negative Capacitance Devices