Litcius/Paper detail

<i>Ab Initio</i> Study of Hexagonal Boron Nitride as the Tunnel Barrier in Magnetic Tunnel Junctions

Haichang Lu, Yuzheng Guo, John Robertson

2021ACS Applied Materials & Interfaces17 citationsDOI

Abstract

Two-dimensional hexagonal boron nitride (h-BN) is studied as a tunnel barrier in magnetic tunnel junctions (MTJs) as a possible alternative to MgO. The tunnel magnetoresistance (TMR) of such MTJs is calculated as a function of whether the interface involves the chemi- or physisorptive site of h-BN atoms on the metal electrodes, Fe, Co, or Ni. It is found that the physisorptive site on average produces higher TMR values, whereas the chemisorptive site has the greater binding energy but lower TMR. It is found that alloying the electrodes with an inert metal-like Pt can induce the preferred absorption site on Co to become a physisorptive site, enabling a higher TMR value. It is found that the choice of physisorptive sites of each element gives more Schottky-like dependence of their Schottky barrier heights on the metal work function.

Topics & Concepts

Materials scienceTunnel magnetoresistanceSchottky barrierMetalBoronCondensed matter physicsWork functionAb initioHexagonal boron nitrideQuantum tunnellingElectrodeTunnel junctionNanotechnologyOptoelectronicsMetallurgyPhysical chemistryChemistryGrapheneOrganic chemistryDiodeLayer (electronics)PhysicsGraphene research and applicationsQuantum and electron transport phenomena2D Materials and Applications