Achieving area-selective atomic layer deposition with fluorinated self-assembled monolayers
Chia-Wei Chang, Hsun‐Hao Hsu, Chain‐Shu Hsu, Jiun‐Tai Chen
Abstract
AS-ALD of Al 2 O 3 using alkylphosphonic acid SAMs with different substituent groups is developed. The fluorinated SAM-modified Co substrates exhibit better blocking ability towards the Al 2 O 3 deposition than the nonfluorinated SAM-modified Co substrate.
Topics & Concepts
SubstituentAtomic layer depositionSelf-assembled monolayerMonolayerMaterials scienceSubstrate (aquarium)Deposition (geology)Layer (electronics)Chemical engineeringNanotechnologyOrganic chemistryChemistryOceanographyEngineeringSedimentGeologyBiologyPaleontologySemiconductor materials and devicesMolecular Junctions and NanostructuresCopper Interconnects and Reliability