Simulation of multiwavelength achromatic metalens in the extreme ultraviolet
Keyang Cheng, Huaiyu Cui, Qi Li, Yongpeng Zhao, Yi Zhou
Topics & Concepts
Extreme ultraviolet lithographyAchromatic lensOpticsExtreme ultravioletNumerical apertureWavelengthDiffractionLithographyMaterials scienceOptoelectronicsPhysicsLaserMetamaterials and Metasurfaces ApplicationsOptical Coatings and GratingsAdvanced Optical Imaging Technologies