Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)
Byunguk Kim, Namgue Lee, Suhyeon Park, Taehun Park, Jaiwon Song, Seungwook Han, Hyunwoo Park, Dahyun Lee, Hohoon Kim, Hyeongtag Jeon
Topics & Concepts
Atomic layer depositionAnataseThin filmX-ray photoelectron spectroscopyRutileTitanium dioxideMaterials scienceTitaniumAnalytical Chemistry (journal)DielectricDeposition (geology)Chemical engineeringNanotechnologyChemistryMetallurgyPhotocatalysisOrganic chemistryCatalysisBiologySedimentPaleontologyEngineeringOptoelectronicsSemiconductor materials and devicesElectronic and Structural Properties of OxidesCatalytic Processes in Materials Science