H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum
Yingying Wang, Jiayi Guo, Chenqi Bai, Lina Xu, Hong‐Ping Xiao, Qian Shi, Yi‐hong Ding, Aidong Li, Guoyong Fang
Topics & Concepts
Atomic layer depositionLayer (electronics)Aluminum oxideDeposition (geology)AluminiumMechanism (biology)ChemistryOxideMaterials scienceInorganic chemistryNanotechnologyMetallurgyPhysicsGeologyPaleontologySedimentQuantum mechanicsSemiconductor materials and devicesCatalytic Processes in Materials ScienceElectronic and Structural Properties of Oxides