A unified semi-global surface reaction model of polymer deposition and SiO2 etching in fluorocarbon plasma
Won-Seok Chang, Yeong Geun Yook, Hae Sung You, Jae‐Hyeong Park, Deuk-Chul Kwon, Mi Young Song, Jung Sik Yoon, Dae Woong Kim, Shin Jae You, Dong Yu, Hyoungcheol Kwon, Sung Kye Park, Yeon‐Ho Im
Topics & Concepts
FluorocarbonEtching (microfabrication)Deposition (geology)PlasmaPlasma etchingInductively coupled plasmaOxideMaterials sciencePolymerOptoelectronicsNanotechnologyAnalytical Chemistry (journal)Chemical engineeringChemistryComposite materialLayer (electronics)MetallurgyOrganic chemistryPhysicsEngineeringQuantum mechanicsPaleontologySedimentBiologyPlasma Diagnostics and ApplicationsSemiconductor materials and devicesMetal and Thin Film Mechanics