Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications
Richard Drevet, Pavel Souček, Pavel Mareš, Martin Dubau, Zsolt Czigány, Katalin Balázsi, Petr Vašina
Topics & Concepts
Materials scienceCrystallinitySputter depositionDielectricThin filmOxideScanning electron microscopeTransmission electron microscopyTantalumAnnealing (glass)SputteringLayer (electronics)Cavity magnetronAnalytical Chemistry (journal)Composite materialOptoelectronicsNanotechnologyMetallurgyChemistryChromatographySemiconductor materials and devicesMetal and Thin Film MechanicsZnO doping and properties