Precise resistance measurement of quantum anomalous Hall effect in magnetic heterostructure film of topological insulator
Yuma Okazaki, Takehiko Oe, Minoru Kawamura, Ryutaro Yoshimi, Shuji Nakamura, Shintaro Takada, Masataka Mogi, Kei Takahashi, Atsushi Tsukazaki, M. Kawasaki, Yoshinori Tokura, Nobu‐Hisa Kaneko
Abstract
The accuracy of Hall resistance in the quantum anomalous Hall effect has been studied at zero magnetic field using Crx(Bi,Sb)2−x Te3-based magnetic heterostructure films of topological insulators. The measured deviation of the Hall resistance from its theoretical value h/e2 was less than 2 ppm when the source drain current was 30 nA. This result has verified that the quantization of the Hall resistance is very accurate in the magnetic heterostructure films and in the previously reported uniformly doped films.
Topics & Concepts
HeterojunctionCondensed matter physicsTopological insulatorQuantum Hall effectMagnetic fieldHall effectQuantization (signal processing)Quantum anomalous Hall effectMaterials scienceThermal Hall effectPhysicsTopology (electrical circuits)Quantum mechanicsElectrical engineeringMathematicsAlgorithmEngineeringTopological Materials and PhenomenaQuantum and electron transport phenomenaGraphene research and applications