Atomic tailoring of low-thermal-budget and nearly wake-up-free ferroelectric Hf0.5Zr0.5O2 nanoscale thin films by atomic layer annealing
Teng-Jan Chang, Yu‐Sen Jiang, Sheng‐Han Yi, Chun-Yi Chou, Chin-I Wang, Hsin-Chih Lin, Miin‐Jang Chen
Topics & Concepts
FerroelectricityMaterials scienceAtomic layer depositionThin filmAnnealing (glass)Amorphous solidOptoelectronicsDielectricMonolayerCrystallinityNanotechnologyComposite materialCrystallographyChemistryFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesMXene and MAX Phase Materials