Two-photon lithography for integrated photonic packaging
Shaoliang Yu, Qingyang Du, Cléber Renato Mendonça, Luigi Ranno, Tian Gu, Juejun Hu
Abstract
Photonic integrated circuits (PICs) have long been considered as disruptive platforms that revolutionize optics. Building on the mature industrial foundry infrastructure for electronic integrated circuit fabrication, the manufacturing of PICs has made remarkable progress. However, the packaging of PICs has often become a major barrier impeding their scalable deployment owing to their tight optical alignment tolerance, and hence, the requirement for specialty packaging instruments. Two-photon lithography (TPL), a laser direct-write three-dimensional (3-D) patterning technique with deep subwavelength resolution, has emerged as a promising solution for integrated photonics packaging. This study provides an overview of the technology, emphasizing the latest advances in TPL-enabled packaging schemes and their prospects for adoption in the mainstream photonic industry.