Radical, ion, and photon’s effects on defect generation at SiO2/Si interface during plasma etching
Shota Nunomura, Takayoshi Tsutsumi, Noriharu Takada, Masanaga Fukasawa, Masaru Hori
Topics & Concepts
Etching (microfabrication)PlasmaIonPlasma etchingReactive-ion etchingPhotonMaterials scienceInterface (matter)SiliconOptoelectronicsChemistryNanotechnologyComposite materialPhysicsOpticsNuclear physicsLayer (electronics)Capillary actionOrganic chemistryCapillary numberSemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure AnalysisIon-surface interactions and analysis