Air-based deposition of titanium‑aluminum oxynitride thin films by reactive magnetron sputtering
Hui-Ping Fan, Xin-Xian Yang, Fu‐Hsing Lu
Topics & Concepts
Materials scienceX-ray photoelectron spectroscopyAmorphous solidSputteringTitaniumSputter depositionThin filmChemical engineeringMetallurgyComposite materialAnalytical Chemistry (journal)NanotechnologyCrystallographyEngineeringChemistryChromatographyMetal and Thin Film MechanicsSemiconductor materials and devicesAdvanced ceramic materials synthesis