Realization of preferential (100) oriented AlN thin films on Mo coated Si substrate using reactive RF magnetron sputtering
A. K. Das, Martando Rath, Deleep R. Nair, M. S. Ramachandra Rao, Amitava DasGupta
Topics & Concepts
Materials scienceX-ray photoelectron spectroscopyCrystallinitySubstrate (aquarium)Sputter depositionNitrideThin filmSputteringWurtzite crystal structureMolybdenumDielectricAluminium nitrideOptoelectronicsAnalytical Chemistry (journal)AluminiumComposite materialNanotechnologyMetallurgyChemical engineeringLayer (electronics)ChemistryZincGeologyChromatographyOceanographyEngineeringAcoustic Wave Resonator TechnologiesGaN-based semiconductor devices and materialsMetal and Thin Film Mechanics