Importance of crystallinity improvement in MoS<sub>2</sub> film by compound sputtering even followed by post sulfurization
Shinya Imai, Takuya Hamada, Masaya Hamada, Takanori Shirokura, Iriya Muneta, Kuniyuki Kakushima, Tetsuya Tatsumi, Shigetaka Tomiya, Kazuo Tsutsui, Hitoshi Wakabayashi
Abstract
Abstract The MoS 2 film for chip-size area was synthesized by two step processes consisting of MoS 2 -compound sputtering and post sulfurization. We intentionally revealed that the crystallinity of sulfurized MoS 2 film depends on that of just-after-sputtered film. Therefore, a crystallinity improvement just-after sputtering is mandatory to achieve an excellent quality MoS 2 film after sulfur-vapor annealing for thin film transistor, sensor and human interface device applications.
Topics & Concepts
CrystallinitySputteringMaterials scienceAnnealing (glass)Thin-film transistorThin filmOptoelectronicsTransistorChemical engineeringAnalytical Chemistry (journal)NanotechnologyLayer (electronics)Composite materialChemistryChromatographyElectrical engineeringEngineeringVoltage2D Materials and ApplicationsMXene and MAX Phase MaterialsPerovskite Materials and Applications