A novel precursor towards buffer layer materials: the first solution based CVD of zinc oxysulfide
Malavika A. Bhide, Claire J. Carmalt, Caroline E. Knapp
Abstract
We report the first solution based deposition of zinc oxysulfide, Zn(O,S), thin films <italic>via</italic> aerosol-assisted chemical vapour deposition (AACVD) facilitated by the use of a specifically designed precursor: [Zn<sub>8</sub>(SOCCH<sub>3</sub>)<sub>12</sub>S<sub>2</sub>] (<bold>1</bold>).
Topics & Concepts
Chemical vapor depositionZincMaterials scienceLayer (electronics)Deposition (geology)Thin filmZinc compoundsAtomic layer depositionBuffer (optical fiber)Chemical engineeringInorganic chemistryNanotechnologyMetallurgyChemistrySedimentComputer scienceEngineeringPaleontologyBiologyTelecommunicationsQuantum Dots Synthesis And PropertiesChalcogenide Semiconductor Thin FilmsZnO doping and properties