Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance
Chuangshi Feng, Xiaobin Feng, Guan Zhou, Hongquan Song, Tianli Wang, Wei–Bing Liao, Yang Lü, Fuxiang Zhang
Abstract
Multi-component nitride thin films usually show high hardness and good wear resistance due to the nanoscale structure and solid-solution strengthening effect. However, the state of N atoms in the thin film and its effects on the compressive strength is still unclear. In this work, (AlTiVCr)N multi-component nitride thin films with a face-centered cubic (FCC) structure prepared by the direct current magnetron sputtering method exhibit a superior strength of ~4.5 GPa and final fracture at a strain of ~5.0%. The excellent mechanical properties are attributed to the synergistic effects of the nanocrystalline structure, covalent bonding between N and metal atoms, and interstitial strengthening. Our results could provide an intensive understanding of the relationship between microstructure and mechanical performances for multi-component nitride thin films, which may promote their applications in micro- and nano-devices.