Oxygen plasma-assisted magnetron sputtering deposition of non-stoichiometric Y2O3 films: Influence of oxygen vacancies on etching resistance
Yi Wu, Shu Xiao, Yinong Chen, Wenlu Dong, Jiancheng Liu, Yong Huang, Kejun Shi, Shuyu Fan, Zishuo Ye, Guoliang Tang, Paul K. Chu
Topics & Concepts
OxygenStoichiometryMaterials scienceSputter depositionEtching (microfabrication)Deposition (geology)SputteringPlasmaCavity magnetronChemical engineeringAnalytical Chemistry (journal)Thin filmChemistryComposite materialNanotechnologyLayer (electronics)Environmental chemistryPhysical chemistryGeologyPaleontologyPhysicsQuantum mechanicsSedimentOrganic chemistryEngineeringZnO doping and propertiesGa2O3 and related materialsGas Sensing Nanomaterials and Sensors