Properties of ITO thin films rapid thermally annealed in different exposures of nitrogen gas
Emmanuel R Ollotu, Justine S. Nyarige, Nuru R. Mlyuka, Margaret E. Samiji, Mmantsae Diale
Topics & Concepts
Materials scienceSheet resistanceIndium tin oxideThin filmBand gapAnalytical Chemistry (journal)Surface roughnessScanning electron microscopeTransmittanceIndiumNitrogenOptoelectronicsComposite materialChemistryNanotechnologyLayer (electronics)Organic chemistryChromatographyZnO doping and propertiesThin-Film Transistor TechnologiesChalcogenide Semiconductor Thin Films