Litcius/Paper detail

Polishing-induced material attrition in surface-texturing AlN using a nanoscale polishing tool: An atomic-scale understanding

Phu-Cuong Le, Tan-Tai Do, Te‐Hua Fang, Chun‐I Lee

2024Tribology International24 citationsDOI

Topics & Concepts

PolishingMaterials scienceChemical-mechanical planarizationSurface finishvon Mises yield criterionSubstrate (aquarium)Surface roughnessDislocationNanoscopic scaleComposite materialStress (linguistics)NanotechnologyStructural engineeringFinite element methodOceanographyEngineeringGeologyPhilosophyLinguisticsAdvanced Surface Polishing TechniquesMetal and Thin Film MechanicsDiamond and Carbon-based Materials Research