Preparation of Surface Modified Ceria Nanoparticles as Abrasives for the Application of Chemical Mechanical Polishing (CMP)
Jie Cheng, Shuo Huang, Xinchun Lu
Abstract
In this study, a method to improve the chemical mechanical polishing (CMP) performance of ceria as abrasive particles was proposed. Surface doping of ceria nanoparticles was realized by incipient impregnation method, in order to improve its valance change properties (Ce 3+ /Ce 4+ ). This study presents detailed characterization of the lanthanide-doped CeO 2 by both experimental methods and density functional theory (DFT) calculation. The dispersion stability of the doped ceria nanoparticles in CMP slurries are investigated. Results show that the doped CeO 2 nanoparticles exhibit more oxygen vacancies and higher content of Ce 3+ compared with the pristine CeO 2 . Good dispersion stability of the doped CeO 2 nanoparticles could be achieved by adding dispersants in the CMP slurries.